WebDec 31, 1993 · The development of deep ultraviolet (DUV) resists has necessitated the introduction of new concepts in resist materials and chemistry. Successful DUV resist … WebDOI: 10.1016/0032-3861(92)91053-5 Corpus ID: 96643665; Tetrahydropyranyl protected polyhydroxy-styrene for a chemically amplified deep u.v. resist @article{Hayashi1992TetrahydropyranylPP, title={Tetrahydropyranyl protected polyhydroxy-styrene for a chemically amplified deep u.v. resist}, author={Nobuaki Hayashi and …
Chemical amplification resists: Inception, implementation in device man…
Webresist materials for microlithography. Of particular interest are systems that incorporate chemical amplification. In these systems the initial radiation induced process, photogeneration of the acid or base catalyst within the polymer film, is followed by a cascade of reactions affecting the polymer. WebThe resist is formulated from end capped poly(phthaladehyde), PPA, and a cationic photoinitiator such as a diaryliodonium or triarylsulfonium metal halide. The extreme … ticker ctxs
Chemical amplification resists: History and development …
WebNov 15, 2024 · The chemical amplification resist system composed of partially tBOC-protected PVP, a dissolution inhibitor, and an acid generator are investigated as EB resists. As dissolution inhibitors ... WebJun 11, 1999 · The chemical amplification concept is based on the use of a photochemically-generated acid as a catalyst, which indices a cascade of chemical transformations in the resist film, providing a gain mechanism. This lithographic imaging strategy invented in 1980 has been fully accepted by the microelectronics industry and … WebDec 15, 2003 · The chemical amplification concept aimed at dramatically boosting the resist sensitivity was invented at IBM Research in San Jose, CA, in 1980. The sensitivity enhancement is achieved by generating acid by irradiation, which induces a cascade of chemical transformations in a resist film. A chemically amplified resist based on acid … ticker c\\u0026a